Metal cored solder decal structure and process

ABSTRACT

A system of producing metal cored solder structures on a substrate includes: a decal having a plurality of apertures, the apertures being tapered from a top surface to a bottom surface of the decal; a carrier configured for positioning beneath the bottom of the decal, the carrier having cavities in a top surface and the cavities located in alignment with the apertures of the decal; the decal being configured for positioning on the carrier having the decal bottom surface in contact with the carrier top surface to form feature cavities defined by the decal apertures and the carrier cavities, the feature cavities being shaped to receive a plurality of metal elements therein, the feature cavities configured for receiving molten solder being cooled in the cavities, the decal being separable from the carrier to partially expose metal core solder contacts; and receiving elements of a substrate being configured to receive the metal core solder contacts thereon, and the metal core solder contacts being exposed and positioned on the substrate.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a divisional application of U.S. patent applicationSer. No. 13/565,982. This application is related to the followingcommonly-owned, United States patents, and co-pending United Statespatent applications, the entire contents and disclosures of which areexpressly incorporated by reference herein in their entirety: U.S.patent application Ser. No. 12/121,236, now U.S. Pat. No. 7,780,063,“TECHNIQUES FOR ARRANGING SOLDER BALLS AND FORMING BUMPS”; and U.S.patent application Ser. No. 11/869,573, now U.S. Pat. No. 7,928,585,“SPROCKET OPENING ALIGNMENT PROCESS AND APPARATUS FOR MULTILAYER SOLDERDECAL”; U.S. patent application Ser. No. 12/983,292.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention related to a method and system for producing metalcored solder structures; and the present invention also relates to ametal cored solder decal structure for utilization in manufacturingsemiconductor or flip chip interconnections.

2. Discussion of the Prior Art

The present state of the art is directed to increasing the Cu/Sn ratioin flip chip semiconductor interconnections in order to be able toexploit the benefits of the copper (Cu) content that is containedtherein. Copper possess a high thermal conductivity of about 398 W/m·Kand a low electrical resistivity of about 1.69 mΩ·cm. In comparison,pure Sn has a thermal conductivity of about 67 W/m·K and an electricalresistivity of about 11.4 mΩ·cm, whereas eutectic PbSn solder has athermal conductivity of about 51 W/m·K and an electrical resistivity ofabout 17.0 mΩ·cm. In the current state-of-the-art, there have beenintegrated Cu die-side bumps by using a Cu electroplating process inhigh-volume manufacturing quantities and with disclosed inherentreliability benefits that are related to stress, electromigration andthermal conductivity. Furthermore, it has been ascertained in thetechnology that the etched Cu post substrate technology can,potentially, reduce the actually expected thermal resistance of thesemiconductor or flip chip interconnections.

Moreover, there is also described in Ference, et al., U.S. Pat. No.5,244,143, that the C4 NP (controlled collapse chip connect new process)can be readily extended so as to be capable of providing high Cu/Snratio chip interconnections through the insertion of copper (Cu) spheresinto the center of flip chip joints. U.S. Pat. No. 5,244,143 is commonlyassigned to the present assignee, and the disclosure of which isincorporated herein by reference in its entirety. The foregoing conceptis currently utilized as described in commonly assigned U.S. patentapplication Ser. No. 11/733,840, now U.S. Pat. No. 7,786,001, thedisclosure of which is incorporated herein by reference in its entirety.In that instance, the application provides for an area array compositeinterconnect structure that is constituted of a copper core which isconnected to respective bond pads on a semiconductor device, and apackaging substrate with a solder. However, pursuant to the foregoingco-pending patent application, a process of transferring is described asbeing implemented in two steps in a separate manner with the utilizationof the solder and copper.

Moreover, pursuant to copending U.S. Ser. No. 11/733,840, the foregoingis limited to producing Cu cored solder bumps only on the surface of Si(silicon) wafer, whereas contrastingly in the technology there iscurrently a considerable need to provide for the formation of metalcored solder bumps on a substrate surface, inasmuch as the copper postthat is prevalent on the substrate surface reduces the thermalresistance of the electrical interconnection.

In addition to the foregoing, other aspects known in the art aredisclosed in Buchwalter et. Al., US Patent Publication Nos. 2009/0093111and 2008/0251281; Gruber, U.S. Pat. No. 5,673,846, and Ference, U.S.Pat. No. 5,244,143; all of which are commonly assigned to the presentassignee, and the disclosures of which are incorporated herein byreference in their entireties.

Flip-chip joints are shown in U.S. Pat. No. 7,786,001, commonly assignedto the present assignee, and which disclosure is expressly incorporatedby reference herein in its entirety. U.S. Pat. No. 7,786,001 disclosesan area array composite interconnect structure made up of a copper coreconnected to respective bond pads on a semiconductor device and apackaging substrate with solder. However, the method includes two stepsof transfer processes of solder and Cu, separately. Also, U.S. Pat. No.7,786,001 is limited to making Cu cored solder bumps only on the Siwafer side.

The known art uses a process utilizing copper Si die bumps by employinga copper electroplating process, and entails the need for an extremelyexpensive procedure, inasmuch as it necessitates the application of alithographic process of thick photoresists, whereas other prior artpublications disclose the use of copper post bumps on the side of thesubstrate, and which also require the implementing of lithographicprocesses for the etching of a copper layer.

SUMMARY OF THE INVENTION

There exists a need in the art to form metal cored solder bumps on thesubstrate side because the Cu post on the substrate side reduces theinterconnection thermal resistance. Further, it would be desirable toform metal cored solder bump structures utilizing a simple one steptransfer process.

Accordingly, in order to improve upon and uniquely evidence the currentstate of the technology, the invention provides for a novel metal coredsolder bump fabrication method that is implemented on Si wafers and/orelectronic package substrates. A basic concept of the present inventionuses the combination of a polymer film and a Si fixture in order to formmetal cored solder bumps through the intermediary of only a single steptransfer process. The polymer film which has through-holes foundtherein, aids in the arrangement of metal balls in the Si mold plate andin the implementation of a solder filled IMS (injection molded solder)process in a simultaneous manner. Moreover, the polymer film renders itpossible to form metal cored solder bumps on the surface of thesubstrate because of a close CTE (coefficient of thermal expansion)match with that of the substrate.

Hereby, in contrast with known techniques, the present invention isdirected to providing for an increase in the Cu/Sn ratio of a solderbump in the absence of requiring the application of a lithographyprocess. Moreover, in further improving the prior art and the state ofthe current technology, the present invention requires only a singlestep transfer process, and can be applied in order to form the metalcored bumps on the substrate surface.

It is, accordingly, an object of the present invention to provide asystem for producing metal cored solder structures on a substrateincludes: a decal having a plurality of apertures, the apertures beingtapered from a top surface to a bottom surface of the decal; a carrierconfigured for positioning beneath the bottom of the decal, the carrierhaving cavities in a top surface and the cavities located in alignmentwith the apertures of the decal; the decal being configured forpositioning on the carrier having the decal bottom surface in contactwith the carrier top surface to form feature cavities defined by thedecal apertures and the carrier cavities, the feature cavities beingshaped to receive a plurality of metal elements therein, the featurecavities configured for receiving molten solder being cooled in thecavities, the decal being separable from the carrier to partially exposemetal core solder contacts; and receiving elements of a substrate beingconfigured to receive the metal core solder contacts thereon, and themetal core solder contacts being exposed and positioned on thesubstrate.

In another aspect of the invention, a method of producing metal coredsolder structures on a substrate includes: providing a decal having aplurality of apertures, the apertures being tapered from a top surfaceto a bottom surface of the decal; positioning the decal on a substrate,the substrate having solder wetting pads in a top surface and the padslocated in alignment with the apertures of the decal; positioning thedecal on the substrate having the decal bottom surface in contact withthe substrate top surface to; positioning a plurality of metal elementsin the feature apertures of the decal; filling the feature apertureswith molten solder and cooling the solder; and removing the decal.

In another aspect of the invention, a method of producing metal coredsolder structures on a substrate includes: providing a dry film on asubstrate, the substrate having solder wetting pads; patterning the dryfilm and forming a plurality of apertures on the wetting pads;positioning a plurality of metal elements in the feature apertures ofthe dry film; filling the feature apertures with molten solder andcooling the solder; and removing the dry film.

BRIEF DESCRIPTION OF THE DRAWINGS

The features and advantages of the present disclosure will becomeapparent from the following detailed description of illustrativeembodiments thereof, which is to be read in connection with theaccompanying drawings. The various features of the drawings are not toscale as the illustrations are for clarity in facilitating one skilledin the art in understanding the disclosure in conjunction with thedetailed description. In the drawings:

FIGS. 1A through 1F is a sequence of schematic block diagramsillustrating sequentially a method for a single-step transfer in formingmetal cored solder bumps on Si wafers or organic substrates according toan embodiment of the invention;

FIGS. 2A through 2C is a sequential block diagram illustrating asequence representing a silicon mold transfer to a semiconductor wafer;

FIGS. 3A through 3F are sequential schematic block diagrams illustratinga metal cored solder decal transfer to a decal mold according to anembodiment of the invention;

FIGS. 4A through 4C are sequential schematic block diagrams illustratinga decal mold transfer to an organic substrate from FIGS. 3A-3F;

FIGS. 5A-5C are sequential block diagrams of a process for forming metalcontacts using a mask and a mold for selectively inserting metal spheresaccording to an embodiment of the invention;

FIG. 6 is a block diagram of the process shown in FIGS. 5A-5C showing asecond mask;

FIG. 7 is a block diagram showing injection molding of the mask and moldshown in FIG. 6;

FIGS. 8A-8E are sequential schematic block diagrams illustrating a metalcored solder formation on a structure according to an embodiment of theinvention; and

FIGS. 9A-9F are sequential block diagrams of a process for forming metalcontacts using a dry film lamination according to an embodiment of theinvention.

DETAILED DESCRIPTION OF THE INVENTION

The present disclosure will now be described in greater detail byreferring to the following discussion and drawings that accompany thepresent application. The drawings of the present application, which arereferred to herein below in greater detail, are provided forillustrative purposes and, as such, they are not drawn to scale.

In the following description, numerous specific details are set forth,such as particular structures, components, materials, dimensions,processing steps and techniques, in order to provide a thoroughunderstanding of the present disclosure. However, it will be appreciatedby one of ordinary skill in the art that the present disclosure may bepracticed without these specific details. In other instances, well-knownstructures or processing steps have not been described in detail inorder to avoid obscuring the present disclosure.

It will be understood that when an element as a layer, region orsubstrate is referred to as being “on” or “over” another element, it canbe directly on the other element or intervening elements may also bepresent. In contrast, when an element is referred to as being “directlyon” or “directly over” another element, there are no interveningelements present. It will also be understood that when an element isreferred to as being “connected” or “coupled” to another element, it canbe directly connected or coupled to the other element or interveningelements may be present. In contrast, when an element is referred to asbeing “directly connected” or “directly coupled” to another element,there are no intervening elements present.

Referring to FIGS. 1A-1F and 2A-2C, according to an illustrativeembodiment of the present disclosure, a method 10 and system forprocessing metal cored solder contacts (bumps or structures) on an Siwafer includes providing a decal 14 having apertures 18 or holestherethrough. The apertures 18 are tapered from a top surface 22 of thedecal 14, to a bottom surface 24 of the decal 14 which define theapertures 18. In the embodiment of the invention shown in FIGS. 1A and1B, the decal 14 has a narrower top portion 26 of each of the apertures18, and a wider bottom portion 28 of each of the apertures 18, asdefined by the geometry of the decal 14, and shown in FIG. 1B.

A carrier embodied as a Silicon (Si) fixture or silicon carrier 40includes cavities 44. The carrier 40 has a top surface 46. The cavities44 have a wider top portion 52 and a bottom point 54 thereby beinggenerally “V” shaped forming cavities 44, as shown in FIGS. 1A and 1B.The cavities 44 may be, for example, V, U, or pyramidal shaped.

The decal 14 is moved toward the carrier 40 in direction 60 as shown inFIG. 1B, and positioned on the carrier 40 as shown in FIG. 1C to formfeature cavities 62. The feature cavities 62 are defined by the decalapertures 18 and the carrier cavities 44 of the decal 14 and the carrier40, respectively.

Referring to FIG. 1D, a metal element embodied as a metal ball 72 ispositioned in the feature cavities 62. The metal ball 72 may becomprised of, for example, Cu (copper), Au (Gold), or Ni (Nickel). Thefeature cavity is filled with molten solder 76 as shown in FIG. 1E. Thesolder may be injection molded. The molten solder 76 is cooled. Thedecal 14 is moved away from the carrier 40 in the direction 80 as shownin FIG. 1F. Metal core solder contacts 78 are comprised of the solder 76surrounding the metal ball 72. The metal core solder contacts 78 arepartially exposed when the decal 14 is removed, specifically, a topportion 79 of the metal core solder contacts 78 are exposed.

Referring to FIG. 2A, the metal core solder contacts 78 are positionedon receiving elements 86 of a substrate, which may be embodied as asilicon wafer 82. The carrier 40 is flipped over to be positioned overthe wafer 82 as shown in FIG. 2A. The metal core solder contacts 78 arealigned with the receiving element 86. The receiving elements 86 caninclude Ball Limiting Metallurgy (BLM), positioned in the wafer 82 forreceiving the metal core solder contacts 78, as shown in FIG. 2B.Ball-limiting metallurgy (BLM) is also known as under bump metallization(UBM) and involves the evaporation onto a wafer surface of solderthrough mask openings, the electroplating, or sputtering in an areaarray fashion. The combined carrier 40 and wafer 82, as shown in FIG. 2Bis heated, thereby reflowing the solder 76 of the solder contacts 78, toarrive at the generally spherical shaped metal core solder contacts 78shown in FIG. 2C.

Referring to FIG. 2C, the carrier 40 is removed, in direction 80, afterheating as above, from contact with the metal core solder contacts 78 toexpose the metal core solder contacts 78 on the wafer 82.

Referring to FIGS. 3A-3C, a method 100 and system according to anotherembodiment of the present invention for processing metal cored soldercontacts includes a decal 104 having apertures 108 or holestherethrough. The apertures 108 are tapered from a top surface 112 ofthe decal 104 to a bottom surface 114 of the decal 104. In theembodiment of the invention shown in FIGS. 3A and 3B, the decal 104 hasa narrower top portion 116 of each of the apertures 108, and a widerbottom portion 118 of each of the apertures 108, as defined by thegeometry of the decal 104.

In FIG. 3A, a carrier embodied as a Silicon (Si) fixture or siliconcarrier 120 includes cavities 124. The carrier 120 has a top surface126. The cavities 124 have a generally rectangular geometry with a topopening 126, and an upwardly extending element 130 is positioned on abottom surface 128 of the cavities 124, as shown in FIGS. 3A and 3B.

The decal 104 is moved toward the carrier 120 in direction 60 as shownin FIG. 3B, and positioned on the carrier 120 as shown in FIG. 3C toform feature cavities 140. The feature cavities 140 are defined by thedecal apertures 108 and the carrier cavities 124 of the decal 104 andthe carrier 120, respectively.

Referring to FIG. 3D, a metal element embodied as a metal ball 72 ispositioned in the feature cavities 140. The feature cavity 140 is filledwith molten solder 76 as shown in FIG. 3E. The solder may be injectionmolded. The molten solder 76 is cooled. The decal 104 is moved away fromthe carrier 120 in the direction 80 as shown in FIG. 3F. Metal coresolder contacts 150 are comprised of the solder 76 surrounding the metalball 72, which is held in the decal 104. The metal core solder contacts150 are partially exposed when the decal 104 is removed, specifically, abottom portion 154 of the metal core solder contacts 150 are exposed,and have two legs 158. The narrow opening side 118 of the aperture 108of the decal 104, as opposed to the wide side 116 of the aperture 108,holds the solder contact 150 during the separation of the decal 104 fromthe carrier 120.

Referring to FIG. 4A, the metal core solder contacts 150 are positionedon receiving elements 164 of a substrate, which may be embodied as anorganic substrate 160. The decal 104 is positioned over the organicsubstrate 160 as shown in FIG. 4A. The metal core solder contacts 150are aligned with the receiving element 164. The receiving elements 164may include a specified metallurgy for receiving the metal core soldercontacts 150, as shown in FIG. 4B. The combined decal 104 and organicsubstrate 160, as shown in FIG. 4B is heated, thereby reflowing thesolder 76 of the solder contacts 150, to arrive at the generallyspherical shaped metal core solder contacts 152 shown in FIG. 4C.

Referring to FIG. 4C, the decal 104 is removed, in direction 80, afterheating as above, from holding the metal core solder contacts 152 whichexposes the metal core solder contacts 152 on the organic substrate 160.

Referring to FIGS. 5A-7, a method 200 and system according to anotherembodiment of the present invention for processing solder contactsincludes a mask and a mold for selectively forming metal spheres. InFIG. 5A, a film 202 includes holes 204 positioned over “V” shapedrecesses 210 in a mold 208. Other shapes may be used, for example, a “U”shape. The film 202 may be a polymer film, and the mold may be acomprised of, for example, silicon, glass, or ceramic. As shown in FIG.5B, the recesses 210 may be selectively covered by the film applied tothe mold 208, such that access to the recess 210 is denied. Otherrecesses 210 are available by being aligned with the holes 204 in thefilm 202, as shown in FIG. 5B. Referring to FIG. 5C, metal balls 212 arepositioned within the recesses 210 which are aligned with the holes 204of the film 202 and not covered by the film 202. After the film 202 isremoved from the mold 208, a second film 214 is applied to the mold 208as shown in FIG. 6. The second film 214 has generally frustoconicallyshaped holes 216, however, other geometries may be used. The second film214 with holes 216 pass therethrough. The holes 216 are narrower at thetop than at the bottom of the second film. The holes 216 are alignedwith all the recesses 210 of the mold 208, such that the metal balls 212cannot be removed from the recesses 210, but access to all the recess210 is available. The cavities defined by the holes 216 and recesses 210are filled with solder 220 (for example, using injection molding) toform a metal filled solder contact. The second film 214 may be removedand the mold 208 flipped to position the metal filled solder contactcomprising the solder 220 and the metal balls 212, onto a silicon wafer.

Referring to FIGS. 8A-8E, according to an illustrative embodiment of thepresent disclosure, a method 300 and system for processing metal coredsolder contacts (bumps or structures) on an substrate embodied as asilicon wafer 304 having contact elements 306 on a top surface thereof,as shown in FIG. 8A. The contact elements may be of a Ball LimitingMetallurgy (BLM). A polymer film 310 is positioned over the siliconwafer 304. The film 310 includes apertures 314 therethrough. Theapertures 314 are tapered from a top surface 316 of the film 310, to abottom surface 318 of the film 130 which defines the apertures 314having a generally frustoconical shape. In the embodiment of theinvention shown in FIG. 8B, the film 310 has a narrower top portion ofeach of the apertures 314, and a wider bottom portion of each of theapertures 314, as defined by the geometry of the film 310, and shown inFIG. 8B. Instead of a decal, a dry film can be used and the dry film ispattered by using photolithography of laser drilling method to form FIG.8B, as is shown in an embodiment in FIGS. 9A-9F.

Referring to FIG. 8C, a metal ball 72 is positioned within the aperture314 on the contact element 306 of the combined silicon wafer 304 andfilm 310. The aperture 314 is filled with molten solder 76 as shown inFIG. 8D. The solder may be injection molded. The molten solder 76 iscooled. The film 310 is removed from the silicon wafer 304 as shown inFIG. 8E. Metal core solder contacts 320 are comprised of the solder 76surrounding the metal ball 72. In the case of using dry film, the dryfilm can be removed by using a solvent.

In an alternative embodiment, the same process 300 can be implementedusing an organic substrate instead of a silicon wafer 304. In anotherembodiment, multiple films, for example, two films, can be stacked onone on top of the other, with aligning apertures to form a cavity on topof contact elements 306 of an organic substrate.

Referring to FIGS. 9A-9F, a method 400 and system according to anotherembodiment of the invention for processing solder contacts includespatterning a dry film on a substrate. Like elements of the embodiment ofthe invention shown in FIGS. 8A-8E have the same reference numerals. Adry film 410 is laminated on the silicon wafer 304 having contactelements 306, as shown in FIG. 9B. The film 410 is patterned to form apatterned film 414, for example, by photolithography or laser drilling.The patterned film 414 includes apertures 416 therethrough. Theapertures 416 may be tapered as shown in FIG. 9C, or be non-tapered, orformed having other geometrical configurations.

Referring to FIGS. 9D-9F, the process is similar to that shown in FIGS.8C-8E. In FIG. 9F, the remaining dry film 410 may be removed by using asolvent.

What is claimed is:
 1. A system for producing metal cored solderstructures on a substrate, comprising: a decal having a plurality ofapertures, the apertures being tapered from a top surface to a bottomsurface of the decal; a carrier configured for positioning beneath thebottom of the decal, the carrier having cavities in a top surface andthe cavities located in alignment with the apertures of the decal; thedecal being configured for positioning on the carrier having the decalbottom surface in contact with the carrier top surface to form featurecavities defined by the decal apertures and the carrier cavities, thefeature cavities being shaped to receive a plurality of metal elementstherein, the feature cavities configured for receiving molten solderbeing cooled in the cavities, the decal being separable from the carrierto partially expose metal core solder contacts; and receiving elementsof a substrate being configured to receive the metal core soldercontacts thereon, and the metal core solder contacts being exposed andpositioned on the substrate.
 2. The system of claim 1, wherein the decalis separated from the carrier and removed to expose a top portion ofmetal core solder contacts in the cavities, and the exposed top portionof the metal core solder contacts receiving elements of the substrate,and the carrier is removed to expose the metal core solder contacts onthe receiving elements of the substrate.
 3. The system of claim 1,wherein the carrier is removed to expose a bottom portion of metal coresolder contacts in the apertures, and the exposed bottom portion of themetal core solder contacts are positioned on receiving elements of thesubstrate, and the decal is removed to expose the metal core soldercontacts on the receiving elements of the substrate.
 4. A method ofproducing metal cored solder structures on a substrate, comprising:providing a decal having a plurality of apertures, the apertures beingtapered from a top surface to a bottom surface of the decal; positioningthe decal on a substrate, the substrate having solder wetting pads in atop surface and the pads located in alignment with the apertures of thedecal; positioning the decal on the substrate having the decal bottomsurface in contact with the substrate top surface to; positioning aplurality of metal elements in the feature apertures of the decal;filling the feature apertures with molten solder and cooling the solder;and removing the decal.
 5. The method of claim 4, wherein the substrateis comprised of silicon wafer or organic substrate.
 6. A method ofproducing metal cored solder structures on a substrate, comprising:providing a dry film on a substrate, the substrate having solder wettingpads; patterning the dry film and forming a plurality of apertures onthe wetting pads; positioning a plurality of metal elements in thefeature apertures of the dry film; filling the feature apertures withmolten solder and cooling the solder; and removing the dry film.
 7. Themethod of claim 6, wherein the substrate is comprised of silicon waferor organic substrate.
 8. The method of claim 6, wherein the dry film isconfigured to cover one or more selected feature apertures such that theselected feature apertures are not available for the metal elements.